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Photoresist Spin Coater

 

With CFD analysis, you can design for reduced wafer backside contamination. Fluent's software makes it easy to examine the impact of adjustments to geometry and exhaust or purge airflows. Gain the insight you need to improve system performance, without elaborate testing or prototyping.

Flow streamlines reveal recirculation zones that will be prone to contamination in a photoresist spin coater.
 

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