Rapid Thermal Processing has several advantages such as shorter cycle time, low thermal budget, reduced dopant diffusion, reduced contamination and high throughput. RTP requires fast ramp-up and cool-down, near uniform temperature across the wafer at all times to avoid damage from thermal stress, and precise trajectory following for process repeatability. CFD modeling using Fluent code can guide critical design parameters of the lamp-house, reaction chamber and shower head.

Contour of static temperature in a SEMATECH Reactor