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The tungsten chemical vapor deposition (WCVD) is a key process to fabricate
reliable contacts, and interconnects in manufacturing semiconductor devices.
In the CVD process, tungsten is deposited by hydrogen reduction of WF6.
Fluent's CFD software provides a fast way to optimize the hardware by
combining accurate transport and chemical kinetics models.
Pathlines of SiH4 concentration and tungsten deposition
rates on wafer and pedestal in a Novellus Concept Three ALTUS system.
Courtesy of Novellus Systems, Inc.
Pathlines of SiH4 concentration, contours of WF6 concentration, and
pressure contours on the showerhead in a Novellus 300 mm reactor.
Courtesy of Novellus Systems, Inc.
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